The Tool Desk
Outbyte PC Repair FREEClear out junk files and repair common Windows errorsFree Scan →Outbyte Driver Updater FREEFix the driver behind crashes, sound loss and screen glitchesFind Drivers →In August 2012, Russia’s Rusnano committed €40 million to Mapper Lithography as part of a reported €80 million financing round. The investment was intended to help build and ship the Dutch company’s Matrix electron-beam lithography systems and establish a Russian site to manufacture Mapper lens components. Those were announced plans—not proof that the factory opened or the proposed production targets were achieved.
What Rusnano’s investment was for
EE Times reported on August 28, 2012, that Rusnano, described in the article as a Russian state nanotechnology investment organization, led an €80 million financing round for Mapper Lithography BV, based in Delft, Netherlands. Rusnano supplied €40 million. The round also involved existing shareholders and other investors, plus Dutch government innovation credits through AgentschapNL. EE Times named ADP Industries, Parcom Capital, Hoving and Partners, Technolution, and Demcon among the other participants.
The reported uses of the financing were to build and ship several Matrix systems and develop manufacturing infrastructure intended to support output of at least 20 machines a year. Rusnano’s investment was also intended to establish a Russian manufacturing site for Mapper lens components. The announcement described plans and purposes; the available reporting does not establish whether that Russian site opened or whether the planned annual capacity was reached.
What Mapper’s Matrix system was designed to do
Matrix was presented as a multi-beam, maskless, direct-write electron-beam lithography platform. Rather than use a patterned mask to expose a wafer, e-beam lithography writes patterns directly with focused electron beams. Mapper’s approach used many beams in parallel, aiming to address the throughput constraint of writing with a single beam while retaining maskless exposure.
Quick wins for a faster PC:
Scan for outdated or missing drivers - takes under a minuteDriver Scan →Repair Windows errors before they cause bigger problemsFix Now →#1 Best Overall
- The size is moderate, with 4 anti slip feet that can be placed on the table and the height of the feet can be adjusted.
- The roller can be adjusted to a height of about 4cm.Roller Size: 11 * 3.9INCH ( Length: 11inch, diameter:3.9inch) , Smooth, thicker rollers for better print;
- The handwheel controls movement and the pressure is uniform. Iron frame painted for protection to slow down rusting.
- The PVC layout is sturdy and durable.Panel size: 50 * 32cm (19.7 * 12.6 ");Overall size: 50 * 35 * 41cm (19.7 * 13.8 * 16.1 ")
- Printmaking machine is one of the indispensable tools for making prints; prints can be made into posters, postcards, greeting cards and other artworks, which are widely used in the fields of advertising and publicity, education and appreciation. In addition, prints can be used in the printed decoration of cloth, ceramics and other products, becoming a major element of interior decoration
The 2012 report said Mapper had worked with Taiwan Semiconductor Manufacturing Co. (TSMC) and CEA-Leti on system development, and it noted an early CEA-Leti pre-alpha system. It attributed 22-nanometer lines, spaces, and contact holes in positive chemically amplified resist to the Mapper–TSMC–CEA-Leti Imagine project. The report said that pattern density was considered sufficient for 14-nm and 10-nm logic process technologies. These are reported project results and an assessment from that period, not evidence that Matrix was commercially qualified for those nodes.
2012 system configurations and throughput figures
EE Times described the following Matrix configurations and rates. The figures below are from the 2012 report: some describe a reported system configuration, while others were proposed configurations or targets. They should not be read as verified commercial production rates.
| Configuration or target | Beams | Reported or proposed throughput | How the 2012 report framed it |
|---|---|---|---|
| Matrix 1.1 | 1,326 | One wafer per hour | Reported configuration and throughput |
| Matrix 10.1 | 13,260 | 10 wafers per hour | Proposed configuration and throughput |
| Clustered Matrix 10.10 | Ten Matrix 10.1 systems | 100 wafers per hour | Proposed cluster throughput |
| Matrix platform capability | Up to 13,000 | Not stated | General capability described in the report |
| Manufacturing plan | Not applicable | At least 20 machines per year | Planned capacity announced in the financing report |
The 10.1 and 10.10 rates were proposed, not established commercial output. The report does not show that those systems entered production at the stated throughput, nor that the planned annual machine capacity was attained.
How the 2012 e-beam comparison differs from a current market assessment
The 2012 article framed maskless e-beam as potentially useful for low-volume production and contrasted it with EUV lithography, which the article described at the time as favored for high-volume manufacturing below 20 nm. That was a period-specific industry comparison. It should not be treated as a statement about current lithography choices, market leadership, or the present capabilities of either technology.
What happened to Mapper Lithography
ASML’s January 28, 2019 announcement said Mapper had been declared bankrupt on December 28, 2018. ASML said it had agreed to acquire Mapper’s intellectual-property assets and intended to offer suitable positions to Mapper employees in research and development and product assembly. ASML described the acquired IP and accumulated knowledge as support for further innovation in the Netherlands.
The bankruptcy and IP announcement do not establish what happened to each Matrix machine, whether any remained in operation, or whether the planned Russian lens-component facility ever operated. The 2012 financing announcement and the 2019 ASML announcement do not resolve those questions.
Independent reader supportYour contribution helps us test, update, and keep practical guides available for everyone.Why Rusnano backed the project
Mapper was a semiconductor-equipment supplier rather than a chipmaker: its proposed role was at the start of the semiconductor manufacturing value chain. EE Times quoted Rusnano managing director Dmitriy Lisenkov, from a statement issued by Mapper, saying: “Mapper stands at the very beginning of the semiconductor value chain, so this investment strengthens the synergy among Rusnano’s microelectronic projects.”
The statement explains the strategic rationale Rusnano gave at the time. It does not establish a financial return on the investment or completion of the production and manufacturing plans.
Quick Recap
Product prices and availability are accurate as of the date/time indicated and are subject to change. Any price and availability information displayed on Amazon at the time of purchase will apply.
